Samco, a manufacturer of etching, deposition and surface treatment processing equipment for the semiconductor and related industries and academic facilities, is proud to introduce the new plasma etching cluster tool “Cluster H.” “With our cutting-edge plasma etching technology, Cluster H provides the full-scale production capabilities for compound semiconductor devices such as high-frequency filters, SiC/GaN power devices, GaAs VCSELs, micro-OLED/LED, CMOS image sensors, and advanced packaging,” said Tsukasa Kawabe, President and COO of Samco.
Veranese Promoted to CEO of AMI
With the continued growth and evolution of Advanced Manufacturing International, Inc. (AMI), the
